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dc.contributor.author	Muhl Saunders, Stephen
dc.contributor.author	Camps Carvajal, Edgar Enrique
dc.contributor.author	ESCOBAR ALARCON, LUIS
dc.contributor.author	OLEA CARDOSO, OSCAR
dc.creator	Muhl Saunders, Stephen ; 2712
dc.creator	Camps Carvajal, Edgar Enrique; 8465
dc.creator	ESCOBAR ALARCON, LUIS; 19586
dc.creator	OLEA CARDOSO, OSCAR; 12524
dc.date.accessioned	2016-03-16T17:19:18Z
dc.date.available	2016-03-16T17:19:18Z
dc.date.issued	1999
dc.identifier	http://www.redalyc.org/articulo.oa?id=94200932
dc.identifier.uri	http://hdl.handle.net/20.500.11799/39982
dc.description	High-density plasmas are often used either in the preparation of thin films or for the modification of surfaces; nitriding. However, except for collision-driven chemical reactions the electrons present are not used, although electron bombardment heating of the work piece nearly always occurs. Principally it is the ions and neutrals that are utilised for materials processing. By suitable biasing of a conducting source material the electrons can be extracted from a highdensity low-pressure plasma to such an extent that evaporation of this source material can be achieved. Due to the presence of the plasma and the flux of electrons a large proportion of the evaporant is expected to be ionised. We have used this novel arrangement to prepare thin films of carbon using a resonant high-density argon plasma and a water cooled rod of high purity graphite. Multiple substrates were used both outside of, and immersed in, the plasma. We report the characteristics of the plasma (electron temperature and density, the ion energy and flux, and optical emission spectra), the deposition process (the evaporation rate and ion/neutral ratio), and the film properties (IR and UV/Vis absorption spectra, Raman spectra, elemental analysis, hardness and refractive index)
dc.format	application/pdf
dc.language.iso	eng	es
dc.publisher	Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
dc.relation	http://www.redalyc.org/revista.oa?id=942
dc.rights	Superficies y vacío
dc.rights	openAccess	es
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/4.0
dc.source	Superficies y vacío (México) Num.9
dc.subject	Física, Astronomía y Matemáticas	es
dc.subject.classification	CIENCIAS FÍSICO MATEMÁTICAS Y CIENCIAS DE LA TIERRA
dc.title	Electron evaporation of carbon using a high density plasma	es
dc.type	Artículo	es
dc.provenance	Científica	es
dc.road	Dorada	es
dc.ambito	Internacional	es
dc.audience	students	es
dc.audience	researchers	es
dc.type.conacyt	article
dc.identificator	1

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